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Custom Engineered-Grade Quartz Source Bottles for CVD/ALD Systems -TOQUARTZ®

TOQUARTZ® offers high-purity quartz source bottles (up to 99.995% SiO₂) designed specifically for CVD, ALD, and MOCVD applications. Our precursor bottles feature excellent thermal stability (up to 1200°C), superior chemical resistance, and precise dimensional control. These quartz containers are essential components in chemical vapor deposition systems and other advanced material processing equipment.
No MOQ
Custom Design
Factory Direct
Tech Support

Features of Quartz Source Bottles

TOQUARTZ® high-purity quartz source bottles are engineered specifically for applications requiring precise precursor delivery in chemical vapor deposition (CVD), atomic layer deposition (ALD), and related processes. Each one is manufactured using premium-grade quartz material to ensure consistent performance in demanding environments.

Material Properties

Design Features

Custom-designed quartz bubbler system for ALD precursor delivery with precise flow control
TOQUARTZ® Fused Quartz Source Bottles

Technical Specifications of Quartz Source Bottle

TOQUARTZ® quartz source bottles are manufactured to precise specifications to meet the demanding requirements of CVD, ALD, and MOCVD processes. Below are the detailed technical parameters of our quartz source bottles.

Physical Properties

ParameterValue / Description
Density2.2 g/cm³ – Ensures mechanical stability under vacuum and thermal cycling
Maximum Working Temperature1200°C – Suitable for high-temperature precursor vaporization in CVD/MOCVD
Thermal Shock Resistance∆T ≥ 900°C – Withstands rapid heating/cooling in ALD pulsed cycles
Thermal Expansion Coefficient5.5 × 10⁻⁷ /°C (20–800°C) – Minimizes stress during thermal ramping
Thermal Conductivity1.4 W/m·K (at 20°C) – Supports uniform heat distribution in precursor zones

Chemical Properties

ParameterValue / Description
SiO₂ Content≥99.99% – Prevents metal contamination in sub-10nm semiconductor processes
Total Trace Elements<10 ppm – Verified by GDMS for ultra-clean deposition environments
Acid ResistanceExcellent (except HF) – Compatible with halide precursors like TiCl₄, WF₆
Alkali ResistanceGood below 600°C – Suitable for base-sensitive precursor handling

Optical Properties

ParameterValue / Description
Refractive Index1.458 (at 589.3 nm) – Enables visual monitoring of precursor levels
UV Transmission>80% (200–2000 nm) – Supports optical inspection and UV-based process diagnostics
IR TransmissionGood up to 3.5 μm – Allows IR heating and monitoring in MOCVD systems
Note: We offer custom specifications to meet your specific requirements. Contact our engineering team for consultation.

TOQUARTZ® Solving Lab Challenges with Quartz Source Bottles

Quartz Source Bottles for Semiconductor Manufacturing

In semiconductor manufacturing, precursor delivery systems require extremely high-purity containers to prevent contamination that can compromise device performance. CVD and epitaxial growth processes use quartz source bottles to hold and deliver metalorganic compounds and other reactive chemicals. These processes operate at elevated temperatures and require vessels that can maintain their structural integrity while handling corrosive materials.

Key Advantages

TOQUARTZ® solution

A U.S.-based semiconductor OEM faced 12% yield loss due to precursor contamination in TiCl₄-based CVD. TOQUARTZ supplied quartz source bottles with <5 ppb impurity levels and halide-resistant polish. Yield improved by 9.4%, saving $27,000/month in wafer scrap.

Fused Quartz Precursor Bottles for Research & Development

Research institutions and university laboratories require flexible, high-quality CVD precursor containers for experimental work. These facilities often need small batches of custom-designed quartz source bottles for ALD precursor delivery that can be modified as research progresses. Their work frequently involves testing new materials and processes that require specialized vessels with unique geometries.

Key Advantages

TOQUARTZ® solution

A European university lab required 3 unique quartz bubblers for ALD of novel 2D materials. TOQUARTZ delivered all 3 designs within 2 weeks, enabling the team to meet a Horizon 2020 grant milestone and secure €120,000 in continued funding.

Quartz Glass Source Bottles for Advanced Materials Production

Advanced materials manufacturers producing OLED components, photovoltaic cells, and specialized coatings require high-volume, consistent quartz containers for CVD precursors. These production environments operate continuously and demand reliable precursor delivery systems that minimize downtime and maximize yield. The manufacturing processes often involve toxic and corrosive chemicals that must be safely contained and delivered.

Key Advantages

TOQUARTZ® solution

A Korean OLED materials supplier experienced 6-hour/month downtime due to bubbler failure in POCl₃ delivery. TOQUARTZ replaced their source bottles with high-durability quartz units, extending service life by 3.2× and reducing downtime by 83%, saving $18,000/month in lost output.

TOQUARTZ® Customization Services for Quartz Source Bottles

TOQUARTZ® specializes in the design and fabrication of custom quartz source bottles tailored to your specific CVD, ALD, or MOCVD application requirements. Our engineering team works directly with your technical staff to develop precursor delivery solutions that optimize your deposition process.

Design Consultation

Our engineering team analyzes your process requirements and provides technical drawings for custom quartz source bottles. We can modify existing designs or create entirely new configurations to optimize precursor delivery.

Prototype Development

We produce functional prototypes of custom quartz source bottles for ALD precursor delivery with rapid turnaround times. Test your design concepts before committing to production quantities, with typical prototype delivery in 2-3 weeks.

Production Manufacturing

Once your design is finalized, we transition to production manufacturing with rigorous quality control. We maintain consistent specifications across batches and offer flexible production volumes.

High Purity Quartz Precursor Bottles for CVD & ALD

Customization Options

Usage Guidelines of Quartz Source Bottles

Proper handling, installation, and maintenance of quartz source bottles are essential for ensuring optimal performance and extended service life in CVD, ALD, and other deposition processes. The following guidelines will help you maximize the value of your quartz precursor delivery components.

Handling & Installation

Operation & Maintenance

Ready to optimize your precursor delivery system?

High purity customized quartz source bottles for demanding applications,
TOQUARTZ® delivers high-quality solutions with engineering support and quick turnaround times.

Why Partner with TOQUARTZ

Direct Factory Advantage

As a direct manufacturer, we can cut out the numerous intermediate links.

Engineering Expertise

Technical team guides clients from material selection to design optimization, translating specs into deliverables.

Flexible Manufacturing

Handling standard & custom orders via small-batch expertise and prototyping rigor to meet urgent deadlines.

Quality
Assurance

Pre-shipment 3-step validation:
1. dimensional accuracy,
2. material purity ,
3. performance thresholds

Global Supply Chain

Reliable global logistics to industrial hubs (DE/US/JP/KR priority) with trackable milestones.

FAQ

Q: What is a quartz source bottle used for in CVD?

A: A quartz source bottle in CVD (Chemical Vapor Deposition) is used to contain and deliver precursor chemicals that form the deposited film. The high-purity quartz construction prevents contamination while allowing controlled evaporation or bubbling of carrier gas through the precursor to transport it to the reaction chamber.

A: Yes, high-purity quartz offers excellent resistance to most corrosive chemicals including strong acids (except HF), bases below 600°C, and halogen compounds commonly used as precursors. This chemical stability prevents contamination of the precursor and ensures consistent deposition quality.

A: TOQUARTZ® quartz source bottles can withstand continuous operating temperatures up to 1200°C. The material maintains its structural integrity and chemical inertness at these temperatures, making it ideal for high-temperature precursor delivery applications in CVD and ALD processes.

A: Yes, quartz source bottles can be designed specifically for solid precursors. These designs typically feature wider openings for loading, specialized heating zones to control sublimation, and gas flow paths designed to carry the sublimed precursor efficiently to the reaction chamber.

A: Yes, TOQUARTZ® specializes in custom quartz source bottle designs for ALD precursor delivery that match exact system specifications. We can create custom inlet configurations, gas distribution systems, heating zones, and connection types to optimize precursor delivery for your specific ALD process requirements.

Contact our engineering team for technical consultation and pricing. We’ll help you select the optimal specifications for your application requirements.

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