
Custom Quartz Crucibles | 200+ Configurations
✔ Precision engineering: ±0.1mm tolerance with SiC/Al₂O₃ coating options
✔ Quality assured: 100% GD-MS tested for <0.1ppm impurities
Industry-Tailored Features
- Photovoltaic Silicon Production
High-purity fused silica crucibles enable 1680°C polysilicon melting for monocrystalline growth, achieving <12ppm oxygen content in solar-grade silicon ingots.
- Corrosive Chemical Processing
HF-resistant quartz boats withstand 40% hydrofluoric acid exposure at 200°C for 500+ operational hours, essential for fluorination reactions and acid digestion.
- Advanced Material Synthesis
Gas-tight laboratory crucibles with lids facilitate rare-earth alloy synthesis under 10⁻⁶ mbar vacuum, maintaining <0.1% impurity levels in laboratory grade composites.
- Precious Metal Refining
Mirror-polished crucibles (Ra ≤0.2μm) process platinum group metals at 1750°C with <0.03g material loss, critical for jewelry and catalytic converter production.
- Precision Heat Treatment
Vacuum-rated crucible plates anneal Inconel 718 superalloys at 1300°C with ±3°C uniformity, achieving HRC 45 hardness in turbine components.



Fabrication
Fused quartz crucibles remain indispensable for extreme-temperature ashing, reactive chemical tests, and precision metal processing across critical industries.
Optimized for ashing processes, reactive chemical tests, and precision handling of precious or non-precious metals in fused silica containers.
Custom Solution Services
All processes optimized for fused quartz crucibles used in semiconductor manufacturing, high-purity chemical reactions, and extreme temperature applications.
▊Rapid thermal cycling: Withstands 1000°C/min heating rates
▊Chemical inertness: Compatible with 98% H₂SO₄ @500°C
▊Batch consistency: <2% variation across 1000+ units
Design Specification
▌Submit CAD/STP files with ±0.5mm tolerance requirements;
▌Standard capacity: 5mL-50L;
▌Thermal shock resistance validation at ΔT 1000°C
Material Selection
▌99.999% fused silica standard
(alternative: 99.99% for non-critical applications)
▌Thickness options: 1.5-12mm
▌OH content control: <8ppm (low hydroxyl grade)
Precision Forming
▌CNC machining: ±0.1mm dimensional accuracy
▌Maximum size: Φ600×800mm
▌Laser alignment for multi-cavity crucible boats
Surface Treatment
▌Standard: Acid polishing (40% HF, 30min cycle)
▌Optional: Fire polishing at 1250°C
▌Particle count: <50 particles/cm² (>0.3μm)
Quality Verification
▌Helium leak test: <1×10⁻⁶ mbar·L/s
▌Thermal cycling: 1700°C ↔ 25°C, 50 cycles
▌Metrology report: 15+ parameters including concentricity <0.2mm
Parameter | Our Product | Industry Average |
Max Working Temperature | 1750°C | 1650-1700°C |
Thermal Shock Resistance | ΔT 1100°C (Water quench) | ΔT 800-900°C |
Purity Level | 99.999% SiO₂ | 99.95-99.99% SiO₂ |
Metal Impurities | <5ppm (ICP-MS tested) | 15-30ppm |
Dimensional Tolerance | ±0.1mm (Laser scanned) | ±0.3mm |
Surface Roughness | Ra 0.4μm(3-stage polished) | Ra 1.2-1.8μm |
Acid Resistance | 48hrs (40% HF, 25°C) | 24-36hrs |
OH Content | <8ppm | 15-25ppm |
Cycle Life | 300+ heats (1700°C) | 150-200 heats |
Vacuum Performance | 5×10⁻⁷ mbar (Helium leak test) | 1×10⁻⁵ mbar |
Universal Maintenance & Handling for Quartz Crucibles
1. Cleaning Protocols
2. Thermal Cycling Management
3. Storage Conditions
4. Handling Procedures
5. Inspection & Reuse Criteria
6. End-of-Life Disposal
Composition & Properties of Quartz Crucibles
Material Composition
Key Properties
FAQ
Q: How many thermal shock cycles can crucibles withstand in Czochralski processes?
A: Validated for 300+ cycles at ΔT 1200°C (1700°C → 500°C) with zero cracks.
Q: What leak rate ensures vacuum-tight seals for reactive gas reactions?
A: <1×10⁻⁹ mbar·L/s helium leak rate validated via ASTM E499.
Q: What thermal stability is needed for zinc vapor condensation?
A: 0.55×10⁻⁶/°C CTE ensures <0.2mm deformation during 900°C→200°C cycles.
Q: What surface finish prevents sample contamination in trace analysis?
A: Ra ≤0.2μm polished surfaces reduce adhesion to <0.1μg/cm².
Q: How to prevent devitrification during 72h continuous runs?
A: OH-controlled silica (<8ppm) limits crystal growth to <0.5%.