{"id":11370,"date":"2026-07-13T02:00:06","date_gmt":"2026-07-12T18:00:06","guid":{"rendered":"https:\/\/toquartz.com\/?p=11370"},"modified":"2026-02-28T16:21:13","modified_gmt":"2026-02-28T08:21:13","slug":"quartz-thermocouple-tubes-in-semiconductor-manufacturing","status":"publish","type":"post","link":"https:\/\/toquartz.com\/tr\/quartz-thermocouple-tubes-in-semiconductor-manufacturing\/","title":{"rendered":"Kuvars Termokupl T\u00fcp\u00fcn\u00fcn \u00d6zellikleri ve Yar\u0131 \u0130letken F\u0131r\u0131nlarda Kullan\u0131m\u0131"},"content":{"rendered":"

Yar\u0131 iletken \u00fcretimi, \u00e7o\u011fu end\u00fcstriyel ortamda asla kar\u015f\u0131la\u015f\u0131lmayan bir \u00f6l\u00e7\u00fcm hassasiyeti gerektirir. S\u0131cakl\u0131k sadece birka\u00e7 derece bile saparsa, t\u00fcm yonga plakas\u0131 partileri bozulur \u2014 ve termokuplu \u00e7evreleyen koruma t\u00fcp\u00fc, son savunma hatt\u0131d\u0131r.<\/p>\n

Dif\u00fczyon f\u0131r\u0131nlar\u0131, oksidasyon t\u00fcpleri ve CVD reakt\u00f6rleri gibi uygulamalarda, kontaminasyon, yap\u0131sal ar\u0131za veya \u00f6l\u00e7\u00fcm sapmas\u0131n\u0131 g\u00f6ze alamayan m\u00fchendisler i\u00e7in kuvars termokupl t\u00fcpleri tercih edilen malzeme haline gelmi\u015ftir. Bu makale, malzeme \u00f6zellikleri, yap\u0131sal konfig\u00fcrasyonlar, termokupl e\u015fle\u015ftirmeleri, performans parametreleri ve prosese \u00f6zg\u00fc uygulamalar\u0131 kapsayan eksiksiz bir teknik referans sunmaktad\u0131r \u2014 yar\u0131 iletken s\u0131n\u0131f\u0131 termal \u00f6l\u00e7\u00fcmler i\u00e7in erimi\u015f silika koruma t\u00fcplerini de\u011ferlendirmek i\u00e7in gerekli olan her \u015fey.<\/p>\n

Kuvars\u0131n neden t\u00fcm rakip malzemelerden daha \u00fcst\u00fcn performans g\u00f6sterdi\u011fini anlamak, \u00f6ncelikle onun kullan\u0131ld\u0131\u011f\u0131 ortam\u0131 anlamakla ba\u015flar.<\/p>\n

\n

\"Yar\u0131iletken<\/p>\n

Yar\u0131 \u0130letkenlerin Termal Ortam\u0131 ve Koruma T\u00fcplerine Y\u00f6nelik Gereksinimleri<\/h2>\n

Yar\u0131 iletken \u00fcretim s\u00fcre\u00e7lerinin t\u00fcm yelpazesi boyunca, s\u0131cakl\u0131k \u00f6l\u00e7\u00fcm\u00fc ikincil bir i\u015flev de\u011fildir \u2014 bu, s\u00fcrecin ta kendisidir. Termokuplu bar\u0131nd\u0131ran koruma t\u00fcp\u00fc, neredeyse t\u00fcm geleneksel malzemelerin kullan\u0131lamayaca\u011f\u0131 ko\u015fullara dayanabilmelidir.<\/p>\n

Temel Yar\u0131 \u0130letken Is\u0131l \u0130\u015flemlerinde S\u0131cakl\u0131k Ko\u015fullar\u0131<\/h3>\n

Yar\u0131 iletken termal i\u015flemleri, geni\u015f ve zorlu bir s\u0131cakl\u0131k aral\u0131\u011f\u0131n\u0131 kapsar ve her i\u015flem b\u00f6lgesi, i\u00e7ine yerle\u015ftirilen koruma borusuna kendine \u00f6zg\u00fc mekanik ve kimyasal y\u00fckler uygular.<\/p>\n

Bor veya fosfor katk\u0131s\u0131 i\u00e7in kullan\u0131lan yatay dif\u00fczyon f\u0131r\u0131nlar\u0131 genellikle \u015fu aral\u0131kta \u00e7al\u0131\u015f\u0131r: 900 \u00b0C ve 1100 \u00b0C<\/strong>, baz\u0131 geli\u015fmi\u015f oksidasyon d\u00f6ng\u00fclerinde ise 1200\u00b0C<\/strong> yerel s\u0131cak b\u00f6lgelerde. Silikon nitr\u00fcr veya polisilikon biriktirme ama\u00e7l\u0131 d\u00fc\u015f\u00fck bas\u0131n\u00e7l\u0131 kimyasal buhar biriktirme (LPCVD) i\u015flemleri, 600 \u00b0C ve 900 \u00b0C<\/strong>, oysa atmosferik bas\u0131n\u00e7l\u0131 oksidasyon f\u0131r\u0131nlar\u0131 950 \u00b0C ile 1100 \u00b0C aras\u0131<\/strong> her d\u00f6ng\u00fcde saatlerce kesintisiz olarak. H\u0131zl\u0131 termal i\u015fleme (RTP) sistemleri, farkl\u0131 sens\u00f6r mimarileri kullanmalar\u0131na ra\u011fmen, 1250\u00b0C<\/strong> saniyeler i\u00e7inde.<\/p>\n

\u00dcretim f\u0131r\u0131nlar\u0131ndaki \u0131s\u0131l homojenlik toleranslar\u0131 genellikle \u00b10,5 \u00b0C ile \u00b11,0 \u00b0C aral\u0131\u011f\u0131nda tutulur.<\/strong> boru uzunlu\u011fu boyunca. Is\u0131l k\u00fctle tutars\u0131zl\u0131\u011f\u0131na, geometrik bozulmaya veya b\u00f6lgesel emisyon katsay\u0131s\u0131 de\u011fi\u015fkenli\u011fine yol a\u00e7an herhangi bir koruma borusu, b\u00f6lge s\u0131cakl\u0131\u011f\u0131 \u00f6l\u00e7\u00fcmlerini bozacakt\u0131r \u2014 bu nedenle \u00e7al\u0131\u015fma s\u0131cakl\u0131\u011f\u0131nda boyutsal kararl\u0131l\u0131k, tart\u0131\u015fmaya a\u00e7\u0131k olmayan bir teknik \u015fartt\u0131r.<\/p>\n

Yar\u0131 \u0130letken Is\u0131l \u0130\u015flemlerinde S\u0131cakl\u0131k Aral\u0131klar\u0131<\/h4>\n\n\n\n\n\n\n\n\n\n
S\u00fcre\u00e7<\/th>\nS\u0131cakl\u0131k Aral\u0131\u011f\u0131 (\u00b0C)<\/th>\nAtmosfer<\/th>\nTipik S\u00fcre<\/th>\n<\/tr>\n<\/thead>\n
Bor \/ Fosfor Dif\u00fczyonu<\/td>\n900 \u2013 1100<\/td>\nN\u2082 \/ O\u2082<\/td>\n30 \u2013 120 dakika<\/td>\n<\/tr>\n
Atmosferik Oksidasyon<\/td>\n950 \u2013 1100<\/td>\nO\u2082 \/ H\u2082O<\/td>\n20 \u2013 180 dakika<\/td>\n<\/tr>\n
LPCVD (Si\u2083N\u2084, polikristal silikon)<\/td>\n600 \u2013 900<\/td>\nSiH\u2084, NH\u2083, N\u2082<\/td>\n60 \u2013 240 dakika<\/td>\n<\/tr>\n
Tavlama (RTA \/ F\u0131r\u0131n)<\/td>\n800 \u2013 1150<\/td>\nN\u2082 \/ Ar<\/td>\n10 \u2013 90 dakika<\/td>\n<\/tr>\n
HCl Getterleme \/ Temizleme<\/td>\n950 \u2013 1050<\/td>\nHCl \/ O\u2082<\/td>\n15 \u2013 45 dakika<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

Y\u00fcksek Safl\u0131kta Yonga \u0130\u015flemede Kirlenmeye Kar\u015f\u0131 Hassasiyet<\/h3>\n

Y\u00fcksek s\u0131cakl\u0131klarda i\u015flenen silikon levhalar, metalik kirlenmeye kar\u015f\u0131 son derece hassast\u0131r ve i\u015flem ortam\u0131ndan milimetreler uzakl\u0131kta bulunan koruma t\u00fcp\u00fc, yanl\u0131\u015f malzemeler se\u00e7ilmesi durumunda ba\u015fl\u0131ca kirlenme kayna\u011f\u0131d\u0131r.<\/p>\n

Sodyum (Na\u207a) gibi alkali metal iyonlar\u0131, 300 \u00b0C\u2019nin \u00fczerindeki s\u0131cakl\u0131klarda hareketlidir<\/strong> ve oksit katmanlar\u0131ndan ge\u00e7erek silikon kafesine girebilirler; bu da transist\u00f6r e\u015fik geriliminin kararl\u0131l\u0131\u011f\u0131n\u0131 bozan aray\u00fcz durumlar\u0131 olu\u015fturur. Demir (Fe), nikel (Ni) ve bak\u0131r (Cu), silikonda derin seviye tuzaklar\u0131 olu\u015fturarak az\u0131nl\u0131k ta\u015f\u0131y\u0131c\u0131 \u00f6mr\u00fcn\u00fc azalt\u0131r ve bitmi\u015f cihazlarda ka\u00e7ak ak\u0131m\u0131 h\u0131zland\u0131r\u0131r. \u0130\u015flem s\u0131cakl\u0131\u011f\u0131nda bu elementlerin eser miktarlar\u0131n\u0131 bile gaz haline getiren bir koruma t\u00fcp\u00fc, verimi s\u0131n\u0131rlayan bir kirlilik kayna\u011f\u0131 olu\u015fturur.<\/p>\n

Yar\u0131 iletken f\u0131r\u0131n bile\u015fenlerine ili\u015fkin end\u00fcstri kirlilik spesifikasyonlar\u0131 genellikle \u015funlar\u0131 gerektirir: k\u00fctle baz\u0131nda toplam metalik kirlilik seviyeleri 50 ppb\u2019nin alt\u0131nda<\/strong>, alkali metaller (Na, K, Li) ise a\u015fa\u011f\u0131da tutulurken 5 ppb'lik tek tek<\/strong>. Bu e\u015fik de\u011feri, f\u0131r\u0131n i\u015flem b\u00f6lgesine giren veya bu b\u00f6lgeyle temas eden her t\u00fcrl\u00fc bile\u015fenin \u2014 koruma borular\u0131 dahil \u2014 malzeme se\u00e7imini do\u011frudan s\u0131n\u0131rlamaktad\u0131r.<\/p>\n

Yar\u0131 \u0130letken F\u0131r\u0131n Bile\u015fenleri i\u00e7in \u0130zin Verilen Metalik Safs\u0131zl\u0131k E\u015fikleri<\/h4>\n\n\n\n\n\n\n\n\n\n\n
Element<\/th>\n\u0130zin Verilen En Y\u00fcksek Konsantrasyon (ppb)<\/th>\nKirlenme Etkisi<\/th>\n<\/tr>\n<\/thead>\n
Sodyum (Na)<\/td>\n\u2264 5<\/td>\nKap\u0131 oksit bozulmas\u0131, e\u015fik kaymas\u0131<\/td>\n<\/tr>\n
Demir (Fe)<\/td>\n\u2264 20<\/td>\nTa\u015f\u0131y\u0131c\u0131n\u0131n \u00f6mr\u00fcn\u00fcn k\u0131salmas\u0131<\/td>\n<\/tr>\n
Bak\u0131r (Cu)<\/td>\n\u2264 10<\/td>\nDerin seviyede tuzak olu\u015fumu<\/td>\n<\/tr>\n
Nikel (Ni)<\/td>\n\u2264 20<\/td>\nKa\u00e7ak ak\u0131m art\u0131\u015f\u0131<\/td>\n<\/tr>\n
Potasyum (K)<\/td>\n\u2264 5<\/td>\nMobil iyon kirlili\u011fi<\/td>\n<\/tr>\n
Toplam Metaller<\/td>\n\u2264 50<\/td>\nToplam verim etkisi<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

Yar\u0131 \u0130letken F\u0131r\u0131n Borular\u0131n\u0131n \u0130\u00e7indeki Atmosferik Ko\u015fullar<\/h3>\n

S\u0131cakl\u0131k ve kirlenmenin \u00f6tesinde, yar\u0131 iletken f\u0131r\u0131n borular\u0131n\u0131n i\u00e7indeki kimyasal ortam, i\u00e7ine yerle\u015ftirilen herhangi bir koruma bile\u015fenine \u00fc\u00e7\u00fcnc\u00fc bir gereklilik kategorisi getirir.<\/p>\n

Kuru veya \u0131slak O\u2082 i\u00e7eren oksitleyici atmosferler, ge\u00e7it oksit ve alan oksit b\u00fcy\u00fctmede yayg\u0131n olarak kullan\u0131lmaktad\u0131r. Hidrojen (H\u2082) veya formasyon gaz\u0131 (H\u2082\/N\u2082 kar\u0131\u015f\u0131mlar\u0131) i\u00e7eren indirgeyici atmosferler ise tavlama ve getterleme a\u015famalar\u0131nda kar\u015f\u0131m\u0131za \u00e7\u0131kmaktad\u0131r. Hacimce 1\u20135% konsantrasyonlar\u0131nda HCl gaz\u0131<\/strong> Temizlik d\u00f6ng\u00fcleri s\u0131ras\u0131nda periyodik olarak verilir; bu sayede f\u0131r\u0131n duvarlar\u0131ndaki metalik kirleticiler buharla\u015ft\u0131r\u0131l\u0131r \u2014 bu ortam, \u00e7o\u011fu seramik ve metal malzemeyi a\u015f\u0131nd\u0131r\u0131r ancak y\u00fcksek safl\u0131kta erimi\u015f silika \u00fczerinde kimyasal bir etki b\u0131rakmaz. Ortam kontrol a\u015famalar\u0131nda inert temizleme gazlar\u0131 (N\u2082, Ar) bask\u0131nd\u0131r; bu gazlar kimyasal y\u00fck olu\u015fturmaz, ancak yerle\u015ftirilen herhangi bir t\u00fcp\u00fcn boyutsal kararl\u0131l\u0131\u011f\u0131n\u0131 gerektirir.<\/p>\n

Bu ortamlardan herhangi biriyle \u2014 oksidasyon, indirgenme veya asit sald\u0131r\u0131s\u0131 yoluyla \u2014 reaksiyona giren bir koruma t\u00fcp\u00fc, kirlenme \u00f6nleyici bir bariyer olmaktan \u00e7\u0131k\u0131p bir kirlenme kayna\u011f\u0131na d\u00f6n\u00fc\u015f\u00fcr. Bu nedenle, t\u00fcm proses ortamlar\u0131nda kimyasal inertlik, termal kararl\u0131l\u0131k kadar \u00f6nemlidir<\/strong>, ve tam da bu \u00f6zelliklerin birle\u015fimi sayesinde erimi\u015f silika, yar\u0131 iletken end\u00fcstrisinde standart koruma t\u00fcp\u00fc malzemesi olarak kabul edilmektedir.<\/p>\n

\n

Kuvars\u0131n Termokupl Borular\u0131 \u0130\u00e7in Tercih Edilen Malzeme Olmas\u0131n\u0131 Sa\u011flayan Nedir?<\/h2>\n

Yar\u0131 iletken termal ortamlar\u0131n\u0131n karma\u015f\u0131k gereklilikleri \u2014 a\u015f\u0131r\u0131 s\u0131cakl\u0131k, ultra d\u00fc\u015f\u00fck kirlilik e\u015fikleri ve kimyasal olarak agresif atmosferler \u2014 g\u00f6z \u00f6n\u00fcne al\u0131nd\u0131\u011f\u0131nda, koruma t\u00fcpleri i\u00e7in malzeme se\u00e7imi \u00e7ok de\u011fi\u015fkenli bir optimizasyon s\u00fcrecidir. Erimi\u015f silika t\u00fcm bu k\u0131s\u0131tlamalar\u0131 ayn\u0131 anda kar\u015f\u0131lamaktad\u0131r; bu da, bu malzemenin kuvars termokupl t\u00fcp\u00fc<\/a> bu sekt\u00f6rdeki teknik \u00f6zellikler.<\/p>\n

Erimi\u015f Kuvars\u0131n Termal Kararl\u0131l\u0131\u011f\u0131 ve D\u00fc\u015f\u00fck Termal Genle\u015fme Katsay\u0131s\u0131<\/h3>\n

Bir koruma borusu malzemesinin \u0131s\u0131l genle\u015fme davran\u0131\u015f\u0131, hem ani s\u0131cakl\u0131k de\u011fi\u015fimlerinden hem de boru duvar\u0131 boyunca uzun s\u00fcreli farkl\u0131 \u0131s\u0131tmalardan kaynaklanan \u0131s\u0131l gerilime kar\u015f\u0131 direncini do\u011frudan belirler.<\/p>\n

Eri\u015fke silika, yakla\u015f\u0131k 0,55 \u00d7 10\u207b\u2076\/\u00b0C'lik bir termal genle\u015fme katsay\u0131s\u0131 (CTE) sergiler<\/strong>, 20 \u00b0C ile 1000 \u00b0C aral\u0131\u011f\u0131nda \u00f6l\u00e7\u00fclm\u00fc\u015ft\u00fcr. Bu de\u011fer, end\u00fcstriyel uygulamalarda kullan\u0131lan t\u00fcm oksit malzemeler aras\u0131nda en d\u00fc\u015f\u00fck de\u011ferlerden biridir. Kar\u015f\u0131la\u015ft\u0131rma amac\u0131yla, al\u00fcmina (Al\u2082O\u2083) \u015fu CTE de\u011ferine sahiptir: 7,2 \u00d7 10\u207b\u2076\/\u00b0C<\/strong>, ve mullitin de\u011feri 5,0 \u00d7 10\u207b\u2076\/\u00b0C<\/strong> \u2014 her ikisi de erimi\u015f silikadan sekiz kat daha y\u00fcksektir. Bir f\u0131r\u0131n borusu ortam s\u0131cakl\u0131\u011f\u0131ndan 1000 \u00b0C\u2019ye ve tekrar geriye do\u011fru bir termal d\u00f6ng\u00fcye maruz kald\u0131\u011f\u0131nda, erimi\u015f silika bile\u015fendeki boyutsal de\u011fi\u015fim neredeyse ihmal edilebilir d\u00fczeydeyken, al\u00fcmina veya seramik borularda \u00f6nemli \u00f6l\u00e7\u00fcde i\u00e7 gerilim birikir.<\/p>\n

Bu d\u00fc\u015f\u00fck CTE\u2019nin pratikteki sonucu ola\u011fan\u00fcst\u00fc bir durumdur termal \u015fok direnci<\/strong>. Erimi\u015f silika koruma t\u00fcpleri, k\u0131r\u0131lma olmaks\u0131z\u0131n ortam s\u0131cakl\u0131\u011f\u0131ndan 1000 \u00b0C\u2019lik bir f\u0131r\u0131n ortam\u0131na aktar\u0131labilir; bu \u00f6zellik, f\u0131r\u0131n y\u00fckleme i\u015flemleri s\u0131ras\u0131nda operasyonel a\u00e7\u0131dan b\u00fcy\u00fck \u00f6nem ta\u015f\u0131r. Bu \u00f6zellik, termal \u015fok direnci parametresi (R\u2019) ile nicel olarak ifade edilir ve erimi\u015f silika i\u00e7in, \u201cR\u201d de\u011ferleri genellikle 1000 \u00b0C\u2019yi a\u015far<\/strong> h\u0131zl\u0131 s\u00f6nd\u00fcrme ko\u015fullar\u0131 alt\u0131nda \u2014 1200\u00b0C\u2019nin alt\u0131ndaki aral\u0131kta hi\u00e7bir al\u00fcmina veya silikon karb\u00fcr alternatifinin ula\u015famad\u0131\u011f\u0131 bir de\u011fer.<\/p>\n

CTE: Koruma Borusu Malzemelerinin Kar\u015f\u0131la\u015ft\u0131rmas\u0131<\/h4>\n\n\n\n\n\n\n\n\n\n\n
Malzeme<\/th>\nCTE (\u00d710-\u2076\/\u00b0C)<\/th>\nMaksimum Servis S\u0131cakl\u0131\u011f\u0131 (\u00b0C)<\/th>\nTermal \u015eok Direnci<\/th>\n<\/tr>\n<\/thead>\n
Erimi\u015f Silika (Sentetik)<\/td>\n0.55<\/td>\n1100 (s\u00fcrekli)<\/td>\nM\u00fckemmel<\/td>\n<\/tr>\n
Erimi\u015f Silika (Do\u011fal)<\/td>\n0.55<\/td>\n1050 (s\u00fcrekli)<\/td>\nM\u00fckemmel<\/td>\n<\/tr>\n
Al\u00fcmina (99,7%)<\/td>\n7.2<\/td>\n1700<\/td>\nOrta d\u00fczeyde<\/td>\n<\/tr>\n
Mullit<\/td>\n5.0<\/td>\n1600<\/td>\nOrta d\u00fczeyde<\/td>\n<\/tr>\n
Silikon Karb\u00fcr (SiC)<\/td>\n4.0<\/td>\n1600<\/td>\n\u0130yi<\/td>\n<\/tr>\n
Paslanmaz \u00c7elik (310S)<\/td>\n16.0<\/td>\n1050<\/td>\nZay\u0131f<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

Proses Ortamlar\u0131nda Kuvars Termokupl Borular\u0131n\u0131n Kimyasal \u0130nertli\u011fi<\/h3>\n

T\u00fcm standart yar\u0131 iletken \u00fcretim ortamlar\u0131nda, koruma t\u00fcp\u00fc malzemesinin kimyasal davran\u0131\u015f\u0131 kritik \u00f6neme sahiptir \u2014 bu durum sadece t\u00fcp\u00fcn \u00f6mr\u00fc a\u00e7\u0131s\u0131ndan de\u011fil, ayn\u0131 zamanda yonga ortam\u0131n\u0131n safl\u0131k b\u00fct\u00fcnl\u00fc\u011f\u00fc a\u00e7\u0131s\u0131ndan da \u00f6nemlidir.<\/p>\n

Eriyik silika, yar\u0131 iletken \u00fcretim s\u0131cakl\u0131klar\u0131nda O\u2082, N\u2082, Ar, H\u2082, HCl ve \u00e7o\u011fu asit buhar\u0131 kar\u015f\u0131s\u0131nda kimyasal olarak inerttir.<\/strong> Zaten SiO\u2082 olarak tamamen oksitlenmi\u015f oldu\u011fu i\u00e7in, oksitleyici ortamlarda daha fazla oksitlenmez. 1200\u00b0C\u2019nin alt\u0131ndaki indirgeyici H\u2082 ortamlar\u0131nda, erimi\u015f silika yap\u0131sal ve kimyasal olarak kararl\u0131 kal\u0131r; standart LPCVD veya tavlama ko\u015fullar\u0131 alt\u0131nda \u00f6l\u00e7\u00fclebilir bir indirgeme reaksiyonu g\u00f6stermez. F\u0131r\u0131n temizli\u011finde kullan\u0131lan konsantrasyonlardaki HCl atmosferleri (900\u20131050\u00b0C'de 1\u20135%), y\u00fcksek safl\u0131kta erimi\u015f silika \u00fczerinde \u00f6l\u00e7\u00fclebilir bir a\u015f\u0131nd\u0131rma etkisi yaratmazken, al\u00fcmina t\u00fcpler benzer ko\u015fullar alt\u0131nda y\u00fczey \u00e7ukurla\u015fmas\u0131 ve tane s\u0131n\u0131r\u0131 a\u015f\u0131nmas\u0131 g\u00f6sterir.<\/p>\n

En \u00f6nemli istisna, hidroflorik asit (HF) ve bunun buhar faz\u0131 kar\u015f\u0131l\u0131\u011f\u0131d\u0131r. HF, her s\u0131cakl\u0131kta SiO\u2082\u2019ye h\u0131zla sald\u0131r\u0131r<\/strong>, ayr\u0131ca kuvars termokupl t\u00fcpleri, \u00f6nceden n\u00f6tralizasyon yap\u0131lmadan HF i\u00e7eren ortamlarda veya HF i\u015fleminden sonraki \u0131slak tezgah ortamlar\u0131nda kullan\u0131lmamal\u0131d\u0131r. Bu \u00f6zel istisna d\u0131\u015f\u0131nda, erimi\u015f silika koruma t\u00fcplerinin kimyasal uyumluluk profili, yar\u0131 iletken termal i\u015flem kimyasallar\u0131n\u0131n neredeyse t\u00fcm yelpazesini kapsamaktad\u0131r.<\/p>\n

Eritilmi\u015f Silikan\u0131n Yar\u0131 \u0130letken \u00dcretim Ortamlar\u0131yla Kimyasal Uyumlulu\u011fu<\/h4>\n\n\n\n\n\n\n\n\n\n\n\n
Atmosfer<\/th>\nUyumluluk<\/th>\nNotlar<\/th>\n<\/tr>\n<\/thead>\n
Kuru O\u2082<\/td>\n\u2713 Tamamen uyumlu<\/td>\nTepki yok; zaten tamamen oksitlenmi\u015f<\/td>\n<\/tr>\n
Islak O\u2082 \/ H\u2082O buhar\u0131<\/td>\n\u2713 Uyumlu<\/td>\n1000\u00b0C\u2019nin \u00fczerinde meydana gelen hafif y\u00fczey hidroksilasyonu<\/td>\n<\/tr>\n
N\u2082 \/ Ar (inert)<\/td>\n\u2713 Tamamen uyumlu<\/td>\nHi\u00e7bir i\u015flem s\u0131cakl\u0131\u011f\u0131nda reaksiyon g\u00f6r\u00fclmez<\/td>\n<\/tr>\n
H\u2082 \/ \u015eekillendirme Gaz\u0131<\/td>\n\u2713 1200 \u00b0C\u2019ye kadar dayan\u0131kl\u0131<\/td>\n1200 \u00b0C\u2019nin alt\u0131na d\u00fc\u015f\u00fcr\u00fclmemelidir<\/td>\n<\/tr>\n
HCl (1\u20135%)<\/td>\n\u2713 Uyumlu<\/td>\n\u00d6l\u00e7\u00fclebilir bir y\u00fczey a\u015f\u0131nmas\u0131 yok<\/td>\n<\/tr>\n
HF buhar\u0131<\/td>\n\u2717 Uyumsuz<\/td>\nH\u0131zl\u0131 SiO\u2082 a\u015f\u0131nd\u0131rma; tamamen ka\u00e7\u0131n\u0131lmal\u0131d\u0131r<\/td>\n<\/tr>\n
SiH\u2084 \/ NH\u2083 (CVD)<\/td>\n\u2713 Uyumlu<\/td>\nT\u00fcp\u00fcn d\u0131\u015f y\u00fczeyi ile herhangi bir reaksiyon g\u00f6r\u00fclmez<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

Safl\u0131k Dereceleri ve Eser Metal Kirlili\u011finin Kontrol\u00fc<\/h3>\n

T\u00fcm erimi\u015f silika ayn\u0131 safl\u0131kta \u00fcretilmez ve do\u011fal ile sentetik t\u00fcrler aras\u0131ndaki ayr\u0131m, yar\u0131 iletken uygulamalar\u0131nda i\u015flevsel a\u00e7\u0131dan \u00f6nemlidir.<\/p>\n

Sentetik erimi\u015f silika<\/strong>, y\u00fcksek safl\u0131kta silikon tetraklor\u00fcr\u00fcn (SiCl\u2084) alev hidrolizi veya plazma oksidasyonu yoluyla \u00fcretilen bu madde, SiO\u2082 i\u00e7eri\u011fi \u226599,9991 TP3T (5N)<\/strong> toplam metalik safs\u0131zl\u0131klar\u0131n genellikle \u015fu de\u011ferin alt\u0131nda oldu\u011fu K\u00fctlece 20 ppb<\/strong>. Tek tek alkali metaller (Na, K, Li) a\u015fa\u011f\u0131da yer almaktad\u0131r 1\u20132 ppb<\/strong> y\u00fcksek kaliteli yar\u0131 iletken s\u0131n\u0131f\u0131 malzemeden \u00fcretilmi\u015ftir. Do\u011fal erimi\u015f silika<\/strong>, y\u00fcksek safl\u0131kta kuvars kristali hammaddesinden elde edilen bu \u00fcr\u00fcn, yakla\u015f\u0131k 99.9%<\/strong> toplam metal safs\u0131zl\u0131klar\u0131n\u0131n \u015fu aral\u0131kta oldu\u011fu 50\u2013200 ppb<\/strong> \u2014 bir\u00e7ok end\u00fcstriyel uygulama i\u00e7in yeterli olmakla birlikte, geli\u015fmi\u015f CMOS veya bellek cihaz\u0131 \u00fcretiminde yetersiz kalmaktad\u0131r.<\/p>\n

Safl\u0131k derecesi se\u00e7iminin operasyonel etkisi, en \u00e7ok y\u00fcksek s\u0131cakl\u0131kta ger\u00e7ekle\u015ftirilen oksidasyon ve dif\u00fczyon a\u015famalar\u0131nda belirgindir; bu a\u015famalarda Standartlara uygun olmayan bir koruma t\u00fcp\u00fcnden kaynaklanan Na kirlili\u011fi, MOS transist\u00f6rlerinin e\u015fik gerilimlerini 50\u2013200 mV kadar de\u011fi\u015ftirebilir<\/strong> \u2014 voltaj marj\u0131 spesifikasyonlar\u0131 s\u0131k\u0131 olan cihazlarda i\u015flevsel ar\u0131zalara neden olan bir varyasyon. Yar\u0131 iletken s\u0131n\u0131f\u0131 kuvars termokupl t\u00fcpleri, \u00f6zellikle Na, K, Fe, Cu ve Ni i\u00e7in eser metal i\u00e7eri\u011finin spektrografik analizini de i\u00e7eren eksiksiz malzeme sertifikalar\u0131yla temin edilmelidir.<\/p>\n

Yar\u0131 \u0130letken Termokupl Koruma T\u00fcplerinin Safl\u0131k Dereceleri Kar\u015f\u0131la\u015ft\u0131rmas\u0131<\/h4>\n\n\n\n\n\n\n\n\n
S\u0131n\u0131f<\/th>\nSiO\u2082 \u0130\u00e7eri\u011fi (%)<\/th>\nToplam Metal Miktar\u0131 (ppb)<\/th>\nNa + K (ppb)<\/th>\n\u00d6nerilen Kullan\u0131m Alan\u0131<\/th>\n<\/tr>\n<\/thead>\n
Sentetik (5N)<\/td>\n\u2265 99,999<\/td>\n< 20<\/td>\n< 2<\/td>\nGeli\u015fmi\u015f CMOS, bellek, ge\u00e7it oksit<\/td>\n<\/tr>\n
Sentetik (4N)<\/td>\n\u2265 99.99<\/td>\n< 50<\/td>\n< 5<\/td>\nStandart dif\u00fczyon, LPCVD<\/td>\n<\/tr>\n
Do\u011fal Erimi\u015f Silika<\/td>\n\u2265 99,9<\/td>\n50 \u2013 200<\/td>\n10 \u2013 50<\/td>\nTavlama, kritik olmayan i\u015flemler<\/td>\n<\/tr>\n
Standart End\u00fcstriyel Kuvars<\/td>\n\u2265 99,5<\/td>\n> 200<\/td>\n> 50<\/td>\nYar\u0131 iletken d\u0131\u015f\u0131 uygulamalar<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

Optik \u015eeffafl\u0131k ve \u0130\u015flevsel \u00d6nemi<\/h3>\n

\u015eeffaf erimi\u015f silika, ultraviyole (UV) dalga boylar\u0131ndan yak\u0131n k\u0131z\u0131l\u00f6tesi (NIR) dalga boylar\u0131na kadar geni\u015f bir spektral aral\u0131kta radyasyonu ge\u00e7irir ve bu \u00f6zellik, yar\u0131 iletken f\u0131r\u0131n ortamlar\u0131nda estetik \u00f6tesinde pratik bir \u00f6neme sahiptir.<\/p>\n

\u015eeffaf kuvars termokupl t\u00fcpleri, termokupl ba\u011flant\u0131 noktas\u0131n\u0131n ve kablolar\u0131n durumunun do\u011frudan g\u00f6zle kontrol edilmesini sa\u011flar<\/strong> t\u00fcp\u00fcn \u00e7\u0131kar\u0131lmas\u0131na gerek kalmadan. Plan d\u0131\u015f\u0131 f\u0131r\u0131n a\u00e7\u0131lmalar\u0131n\u0131n hem verim kayb\u0131na hem de termal bozulmaya yol a\u00e7t\u0131\u011f\u0131 y\u00fcksek de\u011ferli \u00fcretim ortamlar\u0131nda, telin oksidasyon durumunu, ba\u011flant\u0131 b\u00fct\u00fcnl\u00fc\u011f\u00fcn\u00fc veya t\u00fcp duvar\u0131 \u00fczerinden biriken kal\u0131nt\u0131lar\u0131 g\u00f6rsel olarak de\u011ferlendirebilme yetene\u011fi, \u00f6nemli bir operasyonel avantaj sa\u011flar. Ayr\u0131ca, optik pirometri veya radyasyon termometrisinin ikincil s\u0131cakl\u0131k referans\u0131 olarak kullan\u0131ld\u0131\u011f\u0131 i\u015flemlerde, \u015feffaf koruma t\u00fcp\u00fc, pirometre ile i\u015flem b\u00f6lgesi aras\u0131nda herhangi bir optik engel olu\u015fturmaz.<\/p>\n

Kontroll\u00fc kabarc\u0131k i\u00e7eri\u011fine sahip erimi\u015f do\u011fal kuvarsdan \u00fcretilen opak (yar\u0131 saydam beyaz) erimi\u015f silika t\u00fcpler, biraz daha y\u00fcksek mekanik mukavemet ve daha d\u00fc\u015f\u00fck k\u0131z\u0131l\u00f6tesi ge\u00e7irgenlik sunar; bu \u00f6zellikleri sayesinde, radyant \u0131s\u0131 y\u00f6netimi veya yak\u0131n k\u0131z\u0131l\u00f6tesi parazit \u0131\u015f\u0131\u011f\u0131n bast\u0131r\u0131lmas\u0131n\u0131n gerekli oldu\u011fu uygulamalarda tercih edilirler. Bu nedenle, \u015feffaf ve opak t\u00fcp \u00e7e\u015fitleri aras\u0131nda se\u00e7im yapmak, i\u015fleme \u00f6zg\u00fc bir karard\u0131r<\/strong>, ve kirlenme kontrol\u00fc ile g\u00f6rsel inceleme imk\u00e2n\u0131n\u0131n \u00f6ncelikli \u00f6nem ta\u015f\u0131d\u0131\u011f\u0131 \u00e7o\u011fu yar\u0131 iletken uygulamas\u0131nda, \u015feffaf sentetik erimi\u015f silika standart olarak kullan\u0131lmaktad\u0131r.<\/p>\n

\n

\"Yar\u0131<\/p>\n

Yar\u0131 \u0130letken Uygulamalar\u0131 i\u00e7in Kuvars Termokupl T\u00fcplerinin Yap\u0131sal Yap\u0131lar\u0131<\/h2>\n

Yar\u0131 iletken f\u0131r\u0131nlar\u0131 i\u00e7in koruma t\u00fcplerini belirleyen m\u00fchendisler a\u00e7\u0131s\u0131ndan, malzeme bile\u015fimi tek ba\u015f\u0131na yeterli de\u011fildir \u2014 kuvars termokupl t\u00fcp\u00fcn\u00fcn geometrik ve yap\u0131sal \u015fekli, belirli f\u0131r\u0131n mimarileriyle ve \u00f6l\u00e7\u00fcm gereksinimleriyle i\u015flevsel uyumlulu\u011funu belirler.<\/p>\n

Tek Delikli ve \u00c7ok Delikli Boru Geometrileri<\/h3>\n

Bir koruma borusunun i\u00e7 \u00e7ap yap\u0131land\u0131rmas\u0131, ka\u00e7 adet termokupl eleman\u0131n\u0131 bar\u0131nd\u0131rabilece\u011fini ve bu elemanlar\u0131n birbirlerinden termal ve elektriksel olarak nas\u0131l yal\u0131t\u0131ld\u0131\u011f\u0131n\u0131 belirler.<\/p>\n

Tek delikli kuvars t\u00fcpler<\/strong> Yar\u0131 iletken f\u0131r\u0131nlar\u0131nda en yayg\u0131n olarak kullan\u0131lan konfig\u00fcrasyondur; bir termokupl \u00e7iftini bar\u0131nd\u0131r\u0131r ve iki termokupl teli genellikle kuvars kabu\u011fun i\u00e7ine yerle\u015ftirilmi\u015f ayr\u0131 bir \u00e7ift delikli al\u00fcmina yal\u0131tkan \u00e7ubuktan ge\u00e7irilir. Bu d\u00fczenleme elektriksel yal\u0131t\u0131m\u0131 sa\u011flarken, kuvars t\u00fcp kimyasal ve termal koruma sa\u011flar. Yar\u0131 iletken uygulamalar\u0131 i\u00e7in standart tek delikli d\u0131\u015f \u00e7aplar 4 mm ila 12 mm<\/strong>, i\u00e7 \u00e7aplar\u0131 2 mm ile 8 mm aras\u0131<\/strong>.<\/p>\n

\u00c7ok delikli borular<\/strong> \u2014 en yayg\u0131n olarak \u00e7ift kanall\u0131 (tek bir kuvars g\u00f6vde i\u00e7inde iki paralel kanal) veya d\u00f6rt kanall\u0131 konfig\u00fcrasyonlar \u2014 birden fazla ba\u011f\u0131ms\u0131z termokupl \u00e7iftinin tek bir tak\u0131l\u0131 d\u00fczene\u011fi payla\u015fmas\u0131na olanak tan\u0131r. Bu \u00f6zellik, alan k\u0131s\u0131tlamalar\u0131 nedeniyle ba\u011f\u0131ms\u0131z t\u00fcp yerle\u015ftirme say\u0131s\u0131n\u0131n s\u0131n\u0131rl\u0131 oldu\u011fu \u00e7ok b\u00f6lgeli f\u0131r\u0131nlarda veya birincil ve yedek termokupl \u00e7iftinin tek bir giri\u015f portunu payla\u015fmas\u0131 gereken durumlarda \u00f6zellikle kullan\u0131\u015fl\u0131d\u0131r. \u00c7ok delikli kuvars t\u00fcplerde delikler aras\u0131 duvar kal\u0131nl\u0131\u011f\u0131 genellikle 0,8 mm ile 1,5 mm aras\u0131ndad\u0131r<\/strong>, ve bu duvar b\u00fct\u00fcnl\u00fc\u011f\u00fcn\u00fc belirli bir s\u0131cakl\u0131kta korumak i\u00e7in, i\u00e7 kabarc\u0131k i\u00e7eri\u011fi d\u00fc\u015f\u00fck olan y\u00fcksek kaliteli erimi\u015f silika gereklidir.<\/p>\n

Yar\u0131 \u0130letken S\u0131n\u0131f\u0131 Koruma T\u00fcpleri i\u00e7in Standart \u0130\u00e7 \u00c7ap Konfig\u00fcrasyonlar\u0131<\/h4>\n\n\n\n\n\n\n\n
Yap\u0131land\u0131rma<\/th>\nDelik Say\u0131s\u0131<\/th>\nTipik D\u0131\u015f \u00c7ap Aral\u0131\u011f\u0131 (mm)<\/th>\nTipik \u0130\u00e7 \u00c7ap (mm)<\/th>\nBirincil Uygulama<\/th>\n<\/tr>\n<\/thead>\n
Tek delikli<\/td>\n1<\/td>\n4 \u2013 12<\/td>\n2 \u2013 8<\/td>\nStandart alan \u00f6l\u00e7\u00fcm\u00fc<\/td>\n<\/tr>\n
\u00c7ift delikli<\/td>\n2<\/td>\n8 \u2013 16<\/td>\nDelik ba\u015f\u0131na 2 \u2013 4 adet<\/td>\nYedek termokupl \u00e7iftleri<\/td>\n<\/tr>\n
D\u00f6rt namlulu<\/td>\n4<\/td>\n14 \u2013 22<\/td>\nDelik ba\u015f\u0131na 1,5 \u2013 3 adet<\/td>\n\u00c7ok elemanl\u0131 kompakt d\u00fczenekler<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

Boyutsal Toleranslar ve Duvar Kal\u0131nl\u0131\u011f\u0131 Spesifikasyonlar\u0131<\/h3>\n

Kuvars termokupl borular\u0131ndaki boyutsal hassasiyet, ikinci planda bir konu de\u011fildir \u2014 borular\u0131n hassas i\u015flenmi\u015f flan\u015flardan ge\u00e7mesi, \u00e7ok b\u00f6lgeli prob gruplar\u0131yla hizalanmas\u0131 ve s\u0131cakl\u0131kta tutarl\u0131 radyal bo\u015fluklar\u0131 korumas\u0131 gereken yar\u0131 iletken f\u0131r\u0131nlar\u0131nda, s\u0131k\u0131 toleranslar operasyonel a\u00e7\u0131dan hayati \u00f6nem ta\u015f\u0131r.<\/p>\n

Yar\u0131 iletken s\u0131n\u0131f\u0131 erimi\u015f silika t\u00fcplerin d\u0131\u015f \u00e7ap toleranslar\u0131 genellikle \u00b10,10 mm ile \u00b10,15 mm aras\u0131nda tutulur<\/strong>, oysa standart end\u00fcstriyel kuvars borularda bu de\u011fer \u00b10,3 mm veya daha fazlad\u0131r. Duvar kal\u0131nl\u0131\u011f\u0131 homojenli\u011fi, \u00b10,1 mm<\/strong> simetrik radyal \u0131s\u0131 transferini sa\u011flamak ve s\u00fcrekli y\u00fck alt\u0131nda termal kaynakl\u0131 e\u011filmeyi \u00f6nlemek amac\u0131yla. Uzunluk toleranslar\u0131 genellikle \u00b11,0 mm ile \u00b12,0 mm aras\u0131<\/strong> 300 mm ile 1500 mm aral\u0131\u011f\u0131ndaki borular i\u00e7in; bu, pratik kesme ve ate\u015fle parlatma s\u0131n\u0131rlamalar\u0131n\u0131 yans\u0131tmaktad\u0131r.<\/p>\n

Duvar kal\u0131nl\u0131\u011f\u0131n\u0131n se\u00e7imi, hem mekanik dayan\u0131kl\u0131l\u0131\u011f\u0131 hem de termal tepki s\u00fcresini do\u011frudan etkiler. Daha ince duvarlar (1,0\u20131,5 mm) termal k\u00fctleyi azalt\u0131r<\/strong> ve termokupl ba\u011flant\u0131 noktas\u0131n\u0131n f\u0131r\u0131n s\u0131cakl\u0131\u011f\u0131 de\u011fi\u015fikliklerine daha h\u0131zl\u0131 tepki vermesini sa\u011flar \u2014 bu \u00f6zellik, b\u00f6lge kontrol\u00fcn\u00fcn tepki h\u0131z\u0131n\u0131 art\u0131r\u0131r. Daha kal\u0131n duvarlar (2,0\u20133,0 mm), ta\u015f\u0131ma s\u0131ras\u0131nda olu\u015fabilecek hasarlara kar\u015f\u0131 direnci art\u0131r\u0131r ve d\u00f6ng\u00fcsel y\u00fckleme ko\u015fullar\u0131nda hizmet \u00f6mr\u00fcn\u00fc uzat\u0131r, ancak termal tepkide hafif bir gecikmeye neden olur. \u00c7o\u011fu yar\u0131 iletken dif\u00fczyon ve oksidasyon uygulamas\u0131nda, duvar kal\u0131nl\u0131klar\u0131 1,5 mm ile 2,0 mm aras\u0131 standart tasar\u0131m aral\u0131\u011f\u0131n\u0131 olu\u015fturur<\/strong>, tepki h\u0131z\u0131 ile mekanik dayan\u0131kl\u0131l\u0131k aras\u0131nda bir denge kurarak.<\/p>\n

Yar\u0131 \u0130letken S\u0131n\u0131f\u0131 Kuvars T\u00fcpler i\u00e7in Boyutsal Spesifikasyon Aral\u0131klar\u0131<\/h4>\n\n\n\n\n\n\n\n\n\n
Parametre<\/th>\nYar\u0131 \u0130letken S\u0131n\u0131f\u0131<\/th>\nStandart End\u00fcstriyel S\u0131n\u0131f<\/th>\n<\/tr>\n<\/thead>\n
OD Tolerans\u0131 (mm)<\/td>\n\u00b1 0,10 \u2013 0,15<\/td>\n\u00b1 0,30 \u2013 0,50<\/td>\n<\/tr>\n
Duvar Kal\u0131nl\u0131\u011f\u0131 Tolerans\u0131 (mm)<\/td>\n\u00b1 0.10<\/td>\n\u00b1 0,20 \u2013 0,30<\/td>\n<\/tr>\n
Duvar Kal\u0131nl\u0131\u011f\u0131 Aral\u0131\u011f\u0131 (mm)<\/td>\n1,0 \u2013 3,0<\/td>\n1,0 \u2013 5,0<\/td>\n<\/tr>\n
Uzunluk Tolerans\u0131 (mm)<\/td>\n\u00b1 1,0 \u2013 2,0<\/td>\n\u00b1 2,0 \u2013 5,0<\/td>\n<\/tr>\n
Delik Konsantrikli\u011fi (mm)<\/td>\n\u00b1 0,05 \u2013 0,10<\/td>\n\u00b1 0,15 \u2013 0,30<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

Kapal\u0131 U\u00e7lu ve A\u00e7\u0131k U\u00e7lu T\u00fcp Yap\u0131land\u0131rmalar\u0131<\/h3>\n

Bir kuvars termokupl koruma borusunun u\u00e7 geometrisi \u2014 \u00f6l\u00e7\u00fcm ucunda kapal\u0131 ya da a\u00e7\u0131k olmas\u0131 fark etmeksizin \u2014 termokupl ba\u011flant\u0131 noktas\u0131n\u0131n kimyasal korunmas\u0131 ve d\u00fczene\u011fin termal \u00f6l\u00e7\u00fcm \u00f6zellikleri \u00fczerinde do\u011frudan etkilere sahiptir.<\/p>\n

Kapal\u0131 u\u00e7lu borular<\/strong> \u00d6l\u00e7\u00fcm ucunda kayna\u015fm\u0131\u015f, s\u0131zd\u0131rmaz bir uca sahiptir ve bu sayede termokupl ba\u011flant\u0131 noktas\u0131 i\u00e7in tamamen kapal\u0131 bir ortam olu\u015fturur. Bu, proses atmosferi gazlar\u0131 ile termokupl teli aras\u0131nda do\u011frudan temas\u0131 \u00f6nler; bu \u00f6zellik, HCl i\u00e7eren temizleme atmosferlerinde, reaktif \u00f6nc\u00fc gazlar\u0131n bulundu\u011fu CVD ortamlar\u0131nda ve termokupl ala\u015f\u0131m\u0131n\u0131n do\u011frudan gaza maruz kalmas\u0131 nedeniyle kimyasal olarak a\u015f\u0131nabilece\u011fi her t\u00fcrl\u00fc i\u015flemde kritik \u00f6neme sahiptir. Kapal\u0131 u\u00e7 konfig\u00fcrasyonu, yar\u0131 iletken f\u0131r\u0131n termokupl tertibatlar\u0131 i\u00e7in standart bir \u00f6zelliktir ve ba\u011flant\u0131 noktas\u0131 ile t\u00fcp ucu aras\u0131ndaki bo\u015fluklar 5 mm ile 15 mm aras\u0131nda<\/strong> genellikle, proses ortam\u0131 ile \u00f6l\u00e7\u00fcm noktas\u0131 aras\u0131nda iyi bir termal ba\u011flant\u0131 sa\u011flanmas\u0131 amac\u0131yla korunur.<\/p>\n

U\u00e7lar\u0131 a\u00e7\u0131k borular<\/strong> Termokupl ba\u011flant\u0131 noktas\u0131n\u0131n proses atmosferine do\u011frudan maruz kalmas\u0131n\u0131 sa\u011flar; bu da daha h\u0131zl\u0131 termal tepki sa\u011flar ve kapal\u0131 u\u00e7lu tasar\u0131mlarda g\u00f6r\u00fclen u\u00e7 iletim gecikmesini ortadan kald\u0131r\u0131r. Ancak bu konfig\u00fcrasyon, yaln\u0131zca proses atmosferinin termokupl ala\u015f\u0131m\u0131yla reaksiyona girmemesi durumunda uygundur \u2014 \u00f6zellikle inert veya hafif oksitleyici N\u2082 ve Ar ortamlar\u0131nda. A\u00e7\u0131k u\u00e7lu erimi\u015f silika t\u00fcpler, yar\u0131 iletken uygulamalar\u0131nda s\u0131n\u0131rl\u0131 \u00f6l\u00e7\u00fcde kullan\u0131lmaktad\u0131r<\/strong>, b\u00fcy\u00fck \u00f6l\u00e7\u00fcde, \u00f6l\u00e7\u00fcm h\u0131z\u0131n\u0131n kirlenme riskinden daha a\u011f\u0131r bast\u0131\u011f\u0131, kontroll\u00fc inert atmosfer alt\u0131nda \u00e7al\u0131\u015fan ara\u015ft\u0131rma f\u0131r\u0131nlar\u0131yla s\u0131n\u0131rl\u0131d\u0131r.<\/p>\n

\n

\"Yar\u0131iletken<\/p>\n

Yar\u0131iletken F\u0131r\u0131nlar\u0131nda Kuvars Koruma T\u00fcpleriyle Birlikte Kullan\u0131lan Termokupl T\u00fcrleri<\/h2>\n

Termokupl teli ala\u015f\u0131m\u0131 ile erimi\u015f silika koruma t\u00fcp\u00fc aras\u0131ndaki malzeme uyumlulu\u011fu, malzeme se\u00e7im s\u00fcreci kapsam\u0131nda do\u011frulanmal\u0131d\u0131r. Kuvars termokupl t\u00fcp d\u00fczeneklerinde, termokupl tipi, \u00f6l\u00e7\u00fcm sisteminin kullan\u0131labilir s\u0131cakl\u0131k \u00fcst s\u0131n\u0131r\u0131n\u0131, do\u011fruluk s\u0131n\u0131f\u0131n\u0131 ve uzun vadeli kararl\u0131l\u0131k davran\u0131\u015f\u0131n\u0131 belirler.<\/p>\n

1100 \u00b0C Alt\u0131ndaki Yar\u0131iletken Uygulamalar\u0131nda K Tipi ve N Tipi Termokupllar<\/h3>\n

Baz metal termokupl t\u00fcrleri aras\u0131nda, 1100\u00b0C\u2019nin alt\u0131nda \u00e7al\u0131\u015fan yar\u0131 iletken f\u0131r\u0131n uygulamalar\u0131nda en yayg\u0131n olarak kullan\u0131lanlar K ve N tipleridir ve her ikisi de genellikle erimi\u015f silika koruma t\u00fcpleri i\u00e7ine yerle\u015ftirilir.<\/p>\n

K tipi termokupllar (Chromel-Alumel, Ni-Cr\/Ni-Al)<\/strong> \u015fu \u00f6l\u00e7\u00fcm aral\u0131\u011f\u0131n\u0131 kapsamaktad\u0131r: -200 \u00b0C ile 1260 \u00b0C aras\u0131<\/strong>, standart do\u011frulu\u011fu \u00b12,2 \u00b0C veya \u00b10,751 TP3T<\/strong> 375 \u00b0C\u2019nin \u00fczerinde (IEC 60584 S\u0131n\u0131f 1). Bunlar bir Seebeck katsay\u0131s\u0131<\/a>1<\/a><\/sup> yakla\u015f\u0131k 41 \u00b5V\/\u00b0C<\/strong> 1000 \u00b0C\u2019de \u2014 standart baz metal t\u00fcrleri aras\u0131nda en y\u00fcksek de\u011fer \u2014 bu da veri toplama sistemlerinde m\u00fckemmel sinyal \u00e7\u00f6z\u00fcn\u00fcrl\u00fc\u011f\u00fcn\u00fc destekler. Bununla birlikte, K tipi termokupllar \u015funa kar\u015f\u0131 hassast\u0131r: \"ye\u015fil \u00e7\u00fcr\u00fckl\u00fck\" oksidasyonu<\/strong> 800 \u00b0C\u2019nin \u00fczerindeki d\u00fc\u015f\u00fck oksijen k\u0131smi bas\u0131n\u00e7l\u0131 ortamlarda, Chromel teli i\u00e7inde kromun se\u00e7ici olarak oksitlendi\u011fi durumlarda. Bu durum, yeterli oksijen i\u00e7eri\u011fi bulunmayan formasyon gaz\u0131 veya N\u2082 temizleme ortamlar\u0131nda kullan\u0131m uygunlu\u011funu s\u0131n\u0131rlamaktad\u0131r.<\/p>\n

N tipi termokupllar (Nicrosil-Nisil)<\/strong> K Tipi\u2019nin oksidasyon karars\u0131zl\u0131\u011f\u0131n\u0131 gidermek \u00fczere \u00f6zel olarak geli\u015ftirilmi\u015ftir ve bunlar 800 \u00b0C\u2019nin \u00fczerinde kayma direncinde \u00f6nemli \u00f6l\u00e7\u00fcde art\u0131\u015f<\/strong>. 1000 \u00b0C\u2019de N tipi termokupllardaki sapma genellikle 100 saat ba\u015f\u0131na 0,5 \u00b0C<\/strong> s\u00fcrekli hizmet s\u00fcresi, buna kar\u015f\u0131l\u0131k 100 saat ba\u015f\u0131na 1\u20133 \u00b0C<\/strong> e\u015fde\u011fer ko\u015fullar alt\u0131nda K tipi i\u00e7in. Bu kararl\u0131l\u0131k, kalibrasyon aral\u0131klar\u0131n\u0131n en aza indirilmesi gereken ve proses tekrarlanabilirli\u011finin s\u0131k\u0131 bir \u015fekilde kontrol edildi\u011fi yar\u0131 iletken tavlama f\u0131r\u0131nlar\u0131nda N tipi termokuplun tercih edilen baz metal termokupl olmas\u0131n\u0131 sa\u011flar. Hem K hem de N tipleri, \u00e7al\u0131\u015fma s\u0131cakl\u0131klar\u0131nda erimi\u015f silika t\u00fcp i\u00e7 y\u00fczeyleriyle kimyasal olarak uyumludur.<\/p>\n

Erimi\u015f Silika T\u00fcplerdeki Baz Metal Termokupl T\u00fcrlerinin Performans Kar\u015f\u0131la\u015ft\u0131rmas\u0131<\/h4>\n\n\n\n\n\n\n\n\n\n\n
M\u00fclkiyet<\/th>\nK tipi<\/th>\nN Tipi<\/th>\n<\/tr>\n<\/thead>\n
S\u0131cakl\u0131k Aral\u0131\u011f\u0131 (\u00b0C)<\/td>\n-200 ila 1260<\/td>\n-200 ila 1300<\/td>\n<\/tr>\n
IEC Do\u011fruluk S\u0131n\u0131f\u0131 (S\u0131n\u0131f 1)<\/td>\n\u00b12,2 \u00b0C veya \u00b10,751 TP3T<\/td>\n\u00b12,2 \u00b0C veya \u00b10,751 TP3T<\/td>\n<\/tr>\n
1000 \u00b0C'de Seebeck Katsay\u0131s\u0131 (\u00b5V\/\u00b0C)<\/td>\n~41<\/td>\n~36<\/td>\n<\/tr>\n
1000 \u00b0C\u2019de kayma (\u00b0C\/100 saat)<\/td>\n1 \u2013 3<\/td>\n< 0.5<\/td>\n<\/tr>\n
Ye\u015fil \u00c7\u00fcr\u00fckl\u00fc\u011fe Kar\u015f\u0131 Duyarl\u0131l\u0131k<\/td>\nY\u00fcksek (> 800 \u00b0C, d\u00fc\u015f\u00fck pO\u2082)<\/td>\nD\u00fc\u015f\u00fck<\/td>\n<\/tr>\n
Erimi\u015f Silika ile Uyumluluk<\/td>\n\u2713 Uyumlu<\/td>\n\u2713 Uyumlu<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

Y\u00fcksek S\u0131cakl\u0131kl\u0131 Dif\u00fczyon ve Oksidasyon F\u0131r\u0131nlar\u0131 i\u00e7in S, R ve B Tipi Termokupllar<\/h3>\n

1100 \u00b0C'nin \u00fczerinde ger\u00e7ekle\u015ftirilen yar\u0131 iletken i\u015flemlerinde \u2014 y\u00fcksek s\u0131cakl\u0131kta oksidasyon, derin dif\u00fczyon ve baz\u0131 LPCVD i\u015flemleri dahil \u2014 erimi\u015f silika t\u00fcplerin i\u00e7ine yerle\u015ftirilmi\u015f de\u011ferli metal termokupl t\u00fcrleri, gerekli olan y\u00fcksek s\u0131cakl\u0131k dayan\u0131m\u0131 ve kirlenmeye kar\u015f\u0131 koruma \u00f6zelliklerini bir arada sunar.<\/p>\n

S Tipi (Pt-10%Rh \/ Pt) ve R Tipi (Pt-13%Rh \/ Pt) termokupllar<\/strong> g\u00fcvenilir bir \u015fekilde \u00e7al\u0131\u015fmak i\u00e7in 1600\u00b0C<\/strong> s\u00fcrekli \u00e7al\u0131\u015fmada, IEC S\u0131n\u0131f 1 do\u011fruluk derecesiyle \u00b11,0 \u00b0C veya \u00b10,251 TP3T<\/strong> 1100 \u00b0C\u2019nin \u00fczerinde. Yar\u0131 iletken f\u0131r\u0131n uygulamalar\u0131nda, bu tip termokupllar, baz metal termokupllar\u0131n sapma s\u0131n\u0131rlar\u0131na yakla\u015ft\u0131\u011f\u0131 1050 \u00b0C\u20131200 \u00b0C aral\u0131\u011f\u0131nda kullan\u0131l\u0131r. Platin-rodyum ala\u015f\u0131mlar\u0131, 1300 \u00b0C'nin \u00fczerindeki s\u0131cakl\u0131klarda rodyum g\u00f6\u00e7\u00fc ve tane b\u00fcy\u00fcmesi<\/strong>, ve silikon buharlar\u0131, fosfor ve bor kaynakl\u0131 kirlenme<\/strong> \u2014 bunlar\u0131n t\u00fcm\u00fc, dif\u00fczyon f\u0131r\u0131n\u0131 atmosferlerinde dopant t\u00fcrleri olarak bulunur. Bu nedenle, erimi\u015f silika koruma t\u00fcp\u00fc, yar\u0131 iletken ortamlar\u0131ndaki S ve R tipi elementler i\u00e7in i\u015flevsel a\u00e7\u0131dan vazge\u00e7ilmezdir: \u00f6l\u00e7\u00fcm d\u00fczene\u011fini i\u015flem b\u00f6lgesinden 5\u201315 mm uzakl\u0131kta tutarken, platin teli reaktif i\u015flem t\u00fcrlerinden izole eder.<\/p>\n

B Tipi (Pt-30%Rh \/ Pt-6%Rh)<\/strong> \u00fcst \u00f6l\u00e7\u00fcm s\u0131n\u0131r\u0131n\u0131 \u015fu de\u011fere geni\u015fletir: 1820 \u00b0C<\/strong>, d\u00fc\u015f\u00fck s\u0131cakl\u0131klarda Seebeck katsay\u0131s\u0131n\u0131n s\u0131f\u0131ra yak\u0131n olmas\u0131 nedeniyle 600\u00b0C\u2019nin alt\u0131ndaki kullan\u0131labilir \u00e7\u0131k\u0131\u015f ihmal edilebilir derecede d\u00fc\u015f\u00fckt\u00fcr. Yar\u0131 iletken f\u0131r\u0131n uygulamalar\u0131nda, B Tipi \u00f6zel ultra y\u00fcksek s\u0131cakl\u0131kta tavlama uygulamalar\u0131nda kullan\u0131l\u0131r. Rodyum i\u00e7eri\u011fi sayesinde rodyum t\u00fckenmesi kaynakl\u0131 sapmaya kar\u015f\u0131 daha az duyarl\u0131<\/strong> S veya R Tipi'ne k\u0131yasla daha dayan\u0131kl\u0131d\u0131r ve silikon kirlili\u011fine kar\u015f\u0131 daha iyi diren\u00e7 g\u00f6sterir. Erimi\u015f silika t\u00fcp korumas\u0131, t\u00fcp\u00fcn yakla\u015f\u0131k 1100 \u00b0C\u2019lik s\u00fcrekli \u00e7al\u0131\u015fma s\u0131cakl\u0131\u011f\u0131 s\u0131n\u0131r\u0131na kadar B Tipi i\u00e7in standart olarak kal\u0131r; bu s\u0131n\u0131r\u0131n \u00fczerinde ise alternatif koruma malzemeleri de\u011ferlendirilmelidir.<\/p>\n

Eriyik Silika Koruma T\u00fcpleriyle Birlikte Kullan\u0131lan De\u011ferli Metal Termokupl T\u00fcrleri<\/h4>\n\n\n\n\n\n\n\n
Tip<\/th>\nKompozisyon<\/th>\nAral\u0131k (\u00b0C)<\/th>\nDo\u011fruluk (IEC S\u0131n\u0131f 1)<\/th>\nTemel S\u0131n\u0131rlama<\/th>\n<\/tr>\n<\/thead>\n
S<\/td>\nPt-10%Rh \/ Pt<\/td>\n0 \u2013 1600<\/td>\n\u00b11,0 \u00b0C veya \u00b10,251 TP3T<\/td>\nRh g\u00f6\u00e7\u00fc > 1300 \u00b0C<\/td>\n<\/tr>\n
R<\/td>\nPt-13%Rh \/ Pt<\/td>\n0 \u2013 1600<\/td>\n\u00b11,0 \u00b0C veya \u00b10,251 TP3T<\/td>\nRh g\u00f6\u00e7\u00fc > 1300 \u00b0C<\/td>\n<\/tr>\n
B<\/td>\nPt-30%Rh \/ Pt-6%Rh<\/td>\n600 \u2013 1820<\/td>\n\u00b10,25% (> 1050 \u00b0C)<\/td>\nD\u00fc\u015f\u00fck \u00e7\u0131k\u0131\u015f < 600 \u00b0C<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n
\n

\"Proses<\/p>\n

Proses Ko\u015fullar\u0131nda Kuvars Termokupl T\u00fcplerine \u0130li\u015fkin Performans Parametreleri<\/h2>\n

Yar\u0131 iletken s\u0131n\u0131f\u0131 uygulamalar i\u00e7in, koruma borusunun se\u00e7imini yaln\u0131zca malzeme \u00f6zelliklerine dayand\u0131rmak yetersizdir. Nicel performans parametreleri \u2014 \u00f6zellikle maksimum \u00e7al\u0131\u015fma s\u0131cakl\u0131\u011f\u0131, termal \u015fok dayan\u0131m\u0131, mekanik y\u00fck direnci ve gaz s\u0131zd\u0131rmazl\u0131\u011f\u0131 ile ilgili olanlar \u2014 borunun maruz kalaca\u011f\u0131 spesifik proses ko\u015fullar\u0131 g\u00f6z \u00f6n\u00fcnde bulundurularak de\u011ferlendirilmelidir.<\/p>\n

Erimi\u015f Silika T\u00fcpler i\u00e7in Maksimum \u00c7al\u0131\u015fma S\u0131cakl\u0131\u011f\u0131 S\u0131n\u0131rlar\u0131<\/h3>\n

F\u00fczyon silika kuvars termokupl t\u00fcp\u00fcn\u00fcn maksimum s\u00fcrekli \u00e7al\u0131\u015fma s\u0131cakl\u0131\u011f\u0131 sabit bir de\u011fer de\u011fildir; bu de\u011fer, t\u00fcp\u00fcn \u015fekline, ortam ko\u015fullar\u0131na, y\u00fcke ve maruz kalma s\u00fcresine ba\u011fl\u0131d\u0131r.<\/p>\n

\u015eeffaf sentetik erimi\u015f silika t\u00fcpler, yakla\u015f\u0131k 1100 \u00b0C\u2019lik bir s\u00fcrekli \u00e7al\u0131\u015fma s\u0131cakl\u0131\u011f\u0131 derecesine sahiptir.<\/strong> oksitleyici veya inert ortamlarda. K\u0131sa s\u00fcreli sapmalar 1250 \u00b0C\u2019lik s\u0131cakl\u0131k, 1 saatten k\u0131sa s\u00fcreler i\u00e7in tolere edilebilir<\/strong>, t\u00fcp\u00fcn mekanik y\u00fck alt\u0131nda olmamas\u0131 ve atmosferik ko\u015fullar\u0131n indirgeyici olmamas\u0131 \u015fart\u0131yla. Yakla\u015f\u0131k 1050\u20131100 \u00b0C, camla\u015fman\u0131n bozulmas\u0131 ba\u015flar<\/strong> \u2014 amorf erimi\u015f silikan\u0131n kristal kristobalite kademeli d\u00f6n\u00fc\u015f\u00fcm\u00fc. Bu faz d\u00f6n\u00fc\u015f\u00fcm\u00fc, y\u00fczeyde opakl\u0131\u011fa, hacim de\u011fi\u015fikli\u011fine ve mekanik mukavemette azalmaya yol a\u00e7arak, sonu\u00e7ta t\u00fcp\u00fcn hizmet \u00f6mr\u00fcn\u00fc s\u0131n\u0131rlamaktad\u0131r.<\/p>\n

Do\u011fal erimi\u015f silika t\u00fcpler, yakla\u015f\u0131k olarak biraz daha d\u00fc\u015f\u00fck bir s\u00fcrekli \u00e7al\u0131\u015fma s\u0131n\u0131r\u0131na sahiptir: 1000\u20131050 \u00b0C<\/strong>, daha d\u00fc\u015f\u00fck s\u0131cakl\u0131klarda camsalla\u015fman\u0131n ortadan kalkmas\u0131n\u0131 h\u0131zland\u0131ran, biraz daha y\u00fcksek safs\u0131zl\u0131k oran\u0131n\u0131 yans\u0131tmaktad\u0131r. Proses s\u0131cakl\u0131klar\u0131n\u0131n s\u0131k\u0131 bir \u015fekilde kontrol edildi\u011fi ve nadiren 1100\u00b0C\u2019yi a\u015ft\u0131\u011f\u0131 yar\u0131 iletken dif\u00fczyon f\u0131r\u0131nlar\u0131nda, sentetik erimi\u015f silika t\u00fcpler yeterli bir marj sa\u011flar<\/strong> i\u015flem s\u0131cakl\u0131\u011f\u0131n\u0131n tepe de\u011ferinin yakla\u015f\u0131k 50\u2013100 \u00b0C \u00fczerinde \u2014 bu, normal \u00e7al\u0131\u015fma d\u00f6ng\u00fcleri alt\u0131nda uzun hizmet \u00f6mr\u00fcn\u00fc s\u00fcrd\u00fcrmek i\u00e7in yeterlidir.<\/p>\n

Erimi\u015f Silika T\u00fcp \u00c7e\u015fitleri i\u00e7in Maksimum \u00c7al\u0131\u015fma S\u0131cakl\u0131\u011f\u0131<\/h4>\n\n\n\n\n\n\n\n
T\u00fcp Tipi<\/th>\nS\u00fcrekli \u00c7al\u0131\u015fma (\u00b0C)<\/th>\nK\u0131sa Vadeli Tepe Noktas\u0131 (\u00b0C)<\/th>\nDevitrifikasyon Ba\u015flang\u0131c\u0131 (\u00b0C)<\/th>\n<\/tr>\n<\/thead>\n
\u015eeffaf Sentetik<\/td>\n1100<\/td>\n1250<\/td>\n1050 \u2013 1100<\/td>\n<\/tr>\n
Opak Sentetik<\/td>\n1050<\/td>\n1200<\/td>\n1000 \u2013 1050<\/td>\n<\/tr>\n
Do\u011fal Erimi\u015f Silika<\/td>\n1000 \u2013 1050<\/td>\n1150<\/td>\n950 \u2013 1000<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

Termal \u015eok Dayan\u0131m\u0131 ve D\u00f6ng\u00fcsel Is\u0131tma Davran\u0131\u015f\u0131<\/h3>\n

Eri\u015fmi\u015f silikan\u0131n son derece d\u00fc\u015f\u00fck CTE de\u011feri, rakip hi\u00e7bir oksit serami\u011fin ula\u015famad\u0131\u011f\u0131 bir termal \u015fok direncine do\u011frudan yol a\u00e7ar ve bu \u00f6zellik, t\u00fcplerin hizmet \u00f6mr\u00fc boyunca y\u00fczlerce termal d\u00f6ng\u00fcye maruz kald\u0131\u011f\u0131 yar\u0131 iletken f\u0131r\u0131nlar\u0131nda \u00f6zellikle b\u00fcy\u00fck \u00f6nem ta\u015f\u0131r.<\/p>\n

Eriyik silika koruma t\u00fcpleri, 1000 \u00b0C\u2019den ortam s\u0131cakl\u0131\u011f\u0131na kadar olan do\u011frudan ani so\u011futmaya dayanabilir<\/strong> k\u0131r\u0131lma olmaks\u0131z\u0131n \u2014 bu durum, e\u015fde\u011fer duvar kal\u0131nl\u0131\u011f\u0131na sahip al\u00fcmina veya mullit borular\u0131 feci bir \u015fekilde par\u00e7alard\u0131. Bu davran\u0131\u015f, k\u0131r\u0131lma olas\u0131l\u0131\u011f\u0131n\u0131n \u2019yi a\u015ft\u0131\u011f\u0131 kritik s\u0131cakl\u0131k fark\u0131 (\u0394T_c) ile nicel olarak ifade edilir: erimi\u015f silika i\u00e7in, \u0394T_c, 1000 \u00b0C\u2019yi a\u015f\u0131yor<\/strong>, yakla\u015f\u0131k olarak Al\u00fcmina (99.5%) i\u00e7in 200 \u00b0C<\/strong> ve Mullit i\u00e7in 350 \u00b0C<\/strong>. So\u011fuk boru gruplar\u0131n\u0131n \u00f6nceden \u0131s\u0131t\u0131lm\u0131\u015f f\u0131r\u0131nlara yerle\u015ftirildi\u011fi f\u0131r\u0131n y\u00fckleme i\u015flemlerinde \u2014 bu, kesikli dif\u00fczyon ekipmanlar\u0131nda rutin bir prosed\u00fcrd\u00fcr \u2014 bu termal \u015fok direnci, seramik alternatiflerde plan d\u0131\u015f\u0131 proses kesintilerinin en yayg\u0131n nedenlerinden biri olan boru k\u0131r\u0131lmas\u0131 ar\u0131za t\u00fcr\u00fcn\u00fc ortadan kald\u0131r\u0131r.<\/p>\n

Uzun s\u00fcreli d\u00f6ng\u00fcsel kullan\u0131mda, F\u00fczyon silika t\u00fcpler boyutsal kararl\u0131l\u0131\u011f\u0131n\u0131 korur<\/strong> polikristal seramiklerin d\u00f6ng\u00fcsel \u00f6mr\u00fcn\u00fc s\u0131n\u0131rlayan kademeli mikro\u00e7atlakla\u015fma veya tane s\u0131n\u0131r\u0131 g\u00f6\u00e7\u00fc olmaks\u0131z\u0131n binlerce \u0131s\u0131tma-so\u011futma d\u00f6ng\u00fcs\u00fcne dayan\u0131r. H\u0131zland\u0131r\u0131lm\u0131\u015f \u00f6m\u00fcr testi s\u0131ras\u0131nda G\u00fcnde 50 d\u00f6ng\u00fc, 25 \u00b0C ile 1000 \u00b0C aras\u0131nda<\/strong> f\u00fczyon silika t\u00fcp\u00fcn b\u00fct\u00fcnl\u00fc\u011f\u00fcn\u00fc \u015fu de\u011ferin \u00f6tesinde kan\u0131tlam\u0131\u015ft\u0131r: \u00d6l\u00e7\u00fclebilir boyutsal de\u011fi\u015fiklik veya yap\u0131sal bozulma olmaks\u0131z\u0131n 2.000 d\u00f6ng\u00fc<\/strong> \u2014 bu rakam, yar\u0131 iletken f\u0131r\u0131nlar\u0131n\u0131n normal \u00e7al\u0131\u015fma programlar\u0131 kapsam\u0131nda uzun y\u0131llar boyunca hizmet \u00f6mr\u00fcn\u00fc desteklemektedir.<\/p>\n

Termal \u015eok Direnci Kar\u015f\u0131la\u015ft\u0131rmas\u0131<\/h4>\n\n\n\n\n\n\n\n\n
Malzeme<\/th>\nKritik \u0394T_c (\u00b0C)<\/th>\nCTE (\u00d710-\u2076\/\u00b0C)<\/th>\nD\u00f6ng\u00fcsel \u00d6m\u00fcr (25\u20131000 \u00b0C d\u00f6ng\u00fcleri)<\/th>\n<\/tr>\n<\/thead>\n
Erimi\u015f Silika<\/td>\n> 1000<\/td>\n0.55<\/td>\n> 2.000<\/td>\n<\/tr>\n
Al\u00fcmina (99,5%)<\/td>\n~200<\/td>\n7.2<\/td>\n200 \u2013 500<\/td>\n<\/tr>\n
Mullit<\/td>\n~350<\/td>\n5.0<\/td>\n300 \u2013 700<\/td>\n<\/tr>\n
Silisyum Karb\u00fcr<\/td>\n~400<\/td>\n4.0<\/td>\n500 \u2013 1000<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

\u00c7al\u0131\u015fma Y\u00fckleri Alt\u0131nda Mekanik Mukavemet ve Bas\u0131n\u00e7 Dayan\u0131m\u0131<\/h3>\n

Ola\u011fan\u00fcst\u00fc termal ve kimyasal performans\u0131na ra\u011fmen, erimi\u015f silika, al\u00fcmina veya silikon karb\u00fcrden daha d\u00fc\u015f\u00fck bir i\u00e7 mekanik mukavemete sahiptir ve bu durum, kurulum tasar\u0131m\u0131 ve boru boyut se\u00e7imi s\u0131ras\u0131nda dikkate al\u0131nmal\u0131d\u0131r.<\/p>\n

\u015eeffaf erimi\u015f silikan\u0131n k\u0131r\u0131lma mod\u00fcl\u00fc (MOR) yakla\u015f\u0131k 50\u201365 MPa'd\u0131r<\/strong> oda s\u0131cakl\u0131\u011f\u0131nda, yakla\u015f\u0131k olarak 1000 \u00b0C\u2019de 40\u201355 MPa<\/strong> \u2014 e\u015fde\u011fer ko\u015fullar alt\u0131nda al\u00fcminan\u0131n (99,7%) MOR de\u011ferinin yakla\u015f\u0131k yar\u0131s\u0131. Bu, erimi\u015f silika t\u00fcplerin, polikristalin seramik muadillerine k\u0131yasla nokta y\u00fcklemesi, ta\u015f\u0131ma s\u0131ras\u0131nda meydana gelen darbe veya kurulum gerilimi nedeniyle k\u0131r\u0131lmaya daha yatk\u0131n oldu\u011fu anlam\u0131na gelir. Duvar kal\u0131nl\u0131\u011f\u0131n\u0131n se\u00e7imi, m\u00fchendislik a\u00e7\u0131s\u0131ndan en \u00f6nemli etkenlerden biridir<\/strong> mekanik riskin y\u00f6netilmesi i\u00e7in: duvar kal\u0131nl\u0131\u011f\u0131n\u0131n 1,5 mm\u2019den 2,5 mm\u2019ye \u00e7\u0131kar\u0131lmas\u0131, borunun kesit alan\u0131n\u0131 yakla\u015f\u0131k iki kat\u0131na \u00e7\u0131kar\u0131r atalet momenti<\/a>2<\/a><\/sup>, yatay f\u0131r\u0131n kurulumlar\u0131nda kendi a\u011f\u0131rl\u0131\u011f\u0131 alt\u0131nda meydana gelen sapmaya kar\u015f\u0131 direnci \u00f6nemli \u00f6l\u00e7\u00fcde art\u0131r\u0131r.<\/p>\n

900 \u00b0C\u2019nin \u00fczerindeki s\u0131cakl\u0131klarda uzun s\u00fcreli yatay kurulum, \u015fu riski beraberinde getirir: viskoz s\u00fcnme (sarkma)<\/strong> erimi\u015f silika t\u00fcplerde. 600 mm\u2019den uzun ve yatay olarak monte edilmi\u015f t\u00fcplerde, 1100\u00b0C\u2019ye yakla\u015fan s\u0131cakl\u0131klarda, birka\u00e7 ay\u0131 a\u015fan hizmet s\u00fcreleri boyunca sarkma \u00f6l\u00e7\u00fclebilir hale gelebilir. Boruyu uzunlu\u011fu boyunca birden fazla noktadan desteklemek<\/strong> \u2014 ya da kesit mod\u00fcl\u00fcn\u00fc art\u0131rmak i\u00e7in biraz daha b\u00fcy\u00fck bir d\u0131\u015f \u00e7ap kullan\u0131lmas\u0131 \u2014 bu durumu hafifletir. Dikey f\u0131r\u0131n d\u00fczenlerinde yer\u00e7ekimi y\u00fck\u00fc, e\u011filme y\u00fck\u00fc yerine eksenel y\u00f6ndedir ve s\u00fcnme riski \u00f6nemli \u00f6l\u00e7\u00fcde azal\u0131r.<\/p>\n

Erimi\u015f Silika ile Rakip Malzemelerin Mekanik \u00d6zellikleri<\/h4>\n\n\n\n\n\n\n\n\n\n
M\u00fclkiyet<\/th>\nErimi\u015f Silika<\/th>\nAl\u00fcmina (99,7%)<\/th>\nSiC<\/th>\n<\/tr>\n<\/thead>\n
Oda S\u0131cakl\u0131\u011f\u0131nda Kopma Mod\u00fcl\u00fc (MPa)<\/td>\n50 \u2013 65<\/td>\n300 \u2013 380<\/td>\n400 - 500<\/td>\n<\/tr>\n
1000 \u00b0C'de Kopma Mod\u00fcl\u00fc (MPa)<\/td>\n40 \u2013 55<\/td>\n250 \u2013 320<\/td>\n350 \u2013 450<\/td>\n<\/tr>\n
Elastik Mod\u00fcl (GPa)<\/td>\n73<\/td>\n370<\/td>\n410<\/td>\n<\/tr>\n
Vickers Sertli\u011fi (GPa)<\/td>\n9<\/td>\n15<\/td>\n25<\/td>\n<\/tr>\n
Yo\u011funluk (g\/cm\u00b3)<\/td>\n2.20<\/td>\n3.90<\/td>\n3.10<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

Y\u00fcksek S\u0131cakl\u0131klarda Gaz Ge\u00e7irgenli\u011fi ve Hermetik B\u00fct\u00fcnl\u00fck<\/h3>\n

Termokupl koruma borusunun gaz bariyeri i\u015flevi, malzeme se\u00e7imi tart\u0131\u015fmalar\u0131nda s\u0131kl\u0131kla g\u00f6z ard\u0131 edilir; oysa bu i\u015flev, operasyonel a\u00e7\u0131dan hayati \u00f6nem ta\u015f\u0131r \u2014 proses gaz\u0131n\u0131n i\u00e7eri girmesine izin veren bir boru, termokupl telini kimyasal sald\u0131r\u0131ya maruz b\u0131rak\u0131r ve \u00f6l\u00e7\u00fcm sisteminin b\u00fct\u00fcnl\u00fc\u011f\u00fcn\u00fc tehlikeye atar.<\/p>\n

Eriyik silika, 1000 \u00b0C\u2019nin alt\u0131ndaki s\u0131cakl\u0131klarda son derece d\u00fc\u015f\u00fck gaz ge\u00e7irgenli\u011fi g\u00f6sterir<\/strong>, helyum ge\u00e7irgenli\u011fi yakla\u015f\u0131k 10\u207b\u00b9\u2070 cm\u00b3\u00b7cm\/(cm\u00b2\u00b7s\u00b7cmHg)<\/strong> oda s\u0131cakl\u0131\u011f\u0131nda \u2014 yayg\u0131n olarak kullan\u0131lan t\u00fcm oksit camlar aras\u0131nda en d\u00fc\u015f\u00fck de\u011ferdir. O\u2082 ve N\u2082 gibi daha a\u011f\u0131r iki atomlu gazlar i\u00e7in ge\u00e7irgenlik, b\u00fcy\u00fckl\u00fck s\u0131ralar\u0131 kadar daha d\u00fc\u015f\u00fckt\u00fcr; bu da, uygun \u015fekilde \u00fcretilmi\u015f kapal\u0131 u\u00e7lu erimi\u015f silika t\u00fcp\u00fcn yar\u0131 iletken \u00fcretim ko\u015fullar\u0131 alt\u0131nda etkili bir \u015fekilde hava ge\u00e7irmez olmas\u0131n\u0131 sa\u011flar. Bu hava ge\u00e7irmezlik, a\u015fa\u011f\u0131dakilere ba\u011fl\u0131d\u0131r: kapal\u0131 u\u00e7ta i\u00e7 kabarc\u0131k, y\u00fczey \u00e7atlaklar\u0131 ve birle\u015fme kusurlar\u0131n\u0131n bulunmamas\u0131<\/strong> \u2014 bunlar\u0131n t\u00fcm\u00fc, tedarik\u00e7i denetim protokolleri arac\u0131l\u0131\u011f\u0131yla do\u011frulanmas\u0131 gereken kalite \u00f6zellikleridir.<\/p>\n

Bunun en \u00f6nemli istisnas\u0131 \u015fudur: 900 \u00b0C\u2019nin \u00fczerindeki s\u0131cakl\u0131klarda hidrojen<\/strong>. H\u2082, y\u00fcksek termal h\u0131za sahip k\u00fc\u00e7\u00fck bir molek\u00fcld\u00fcr ve erimi\u015f silika i\u00e7inden ge\u00e7irgenli\u011fi 900\u00b0C\u2019nin \u00fczerinde \u00f6nemli \u00f6l\u00e7\u00fcde artar; bu art\u0131\u015f, uzun s\u00fcreli i\u015flem s\u00fcreleri boyunca t\u00fcp\u00fcn i\u00e7 k\u0131sm\u0131na \u00f6l\u00e7\u00fclebilir d\u00fczeyde hidrojen giri\u015finin meydana gelebilece\u011fi seviyelere ula\u015f\u0131r. Yakla\u015f\u0131k 900\u00b0C\u2019yi a\u015fan s\u0131cakl\u0131klarda hacimce %5%<\/strong>, t\u00fcp duvar\u0131ndan ge\u00e7en hidrojen dif\u00fczyon h\u0131z\u0131, birka\u00e7 saatlik zaman dilimlerinde termokupl ba\u011flant\u0131 noktas\u0131n\u0131n \u00e7evresindeki yerel atmosferi de\u011fi\u015ftirecek kadar yeterli olabilir. Daha kal\u0131n duvar kal\u0131nl\u0131\u011f\u0131n\u0131n (\u2265 2,0 mm) belirlenmesi ve termokupl kalibrasyon sapmas\u0131n\u0131n izlenmesi<\/strong> Bu \u00f6zel s\u0131n\u0131rlamaya y\u00f6nelik standart m\u00fchendislik \u00e7\u00f6z\u00fcmleri, d\u00fczenli aral\u0131klarla yap\u0131lan i\u015flemlerdir.<\/p>\n

\n

\"Y\u00fcksek<\/p>\n

Yar\u0131 \u0130letken \u00dcretim S\u00fcre\u00e7lerinde Kuvars Termokupl T\u00fcplerinin Uygulamaya \u00d6zel Kullan\u0131m\u0131<\/h2>\n

Modern bir yar\u0131 iletken \u00fcretim tesisinin \u00fcretim ak\u0131\u015f\u0131nda, kuvars termokupl t\u00fcpleri bir\u00e7ok i\u015flem a\u015famas\u0131nda kar\u015f\u0131m\u0131za \u00e7\u0131kar; her bir a\u015fama, o ad\u0131m\u0131n kendine \u00f6zg\u00fc termal ve kimyasal ko\u015fullar\u0131 taraf\u0131ndan belirlenen kendine has i\u015flevsel gereksinimlere sahiptir.<\/p>\n